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  5. Forge Nano, Inc.

Forge Nano, Inc.

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Company Details

Name: Forge Nano, Inc.
Jurisdiction: Colorado
Legal type: Foreign profit corporation
Status: Good Standing
Date of registration: 13 Apr 2011 (14 years ago)
Entity Number: 20111223339
ZIP code: 80241
County: Adams County
Place of Formation: DELAWARE
Principal Address: 12300 Grant St Ste 110 Thornton CO 80241 US

Agent

Name Role Address
Paul Lichty Agent 12300 Grant St Ste 110 Thornton CO 80241 US

U.S. Small Business Administration Profile

Website:
www.forgenano.com
E-Commerce Website:
http://www.forgenano.com
Phone Number:
720-531-1827
E-mail Address:
adameron@forgenano.com
Contact Person:
ARRELAINE DAMERON
User ID:
P1535235

Commercial and government entity program

CAGE number:
6ECN7
Status:
Active
Type:
U.S./Canada Manufacturer
CAGE Update Date:
2024-09-11
CAGE Expiration:
2029-09-11
SAM Expiration:
2025-09-06

Contact Information

POC:
ARRELAINE DAMERON
Corporate URL:
www.forgenano.com

Form 5500 Series

Employer Identification Number (EIN):
452393850
Plan Year:
2023
Number Of Participants:
107
Sponsors Telephone Number:
4052191753
File:
View File
Plan Year:
2022
Number Of Participants:
78
Sponsors Telephone Number:
4052191753
File:
View File
Plan Year:
2021
Number Of Participants:
59
Sponsors Telephone Number:
4052191753
File:
View File
Plan Year:
2020
Number Of Participants:
49
Sponsors Telephone Number:
4052191753
File:
View File
Plan Year:
2019
Number Of Participants:
24
Sponsors Telephone Number:
4052191753
File:
View File

Transaction History

Transaction ID Type Date Effective date Name Comment
20251461117 File Report 2025-04-23 2025-04-23 No data Principal address changed, Change in registered agent information
20241463753 File Report 2024-04-24 2024-04-24 No data Principal address changed, Change in registered agent information
20231456476 File Report 2023-04-26 2023-04-26 No data Principal address changed, Change in registered agent information
20221414560 File Report 2022-04-25 2022-04-25 No data No data
20211382577 File Report 2021-04-23 2021-04-23 No data Change of Entity Address

USAspending Awards / Contracts

Procurement Instrument Identifier:
FA254124CB039
Link:
View Award on USAspending website
Award Or Idv Flag:
AWARD
Award Type:
DEFINITIVE CONTRACT
Action Obligation:
179996.30
Base And Exercised Options Value:
179996.30
Base And All Options Value:
179996.30
Awarding Agency Name:
Department of Defense
Performance Start Date:
2024-08-20
Description:
SF241-0018. THIS SBIR PHASE I CONTRACT WILL EVALUATE AND SELECT COATING MATERIALS TO BE APPLIED TO THE CATHODE MATERIALS TO FOCUS ON THE SPECIFIC ELECTRICAL PERFORMANCE IMPROVEMENTS NEEDED TO ADVANCE THE LIS CHEMISTRY.
Naics Code:
927110: SPACE RESEARCH AND TECHNOLOGY
Product Or Service Code:
AC32: NATIONAL DEFENSE R&D SERVICES; DEFENSE-RELATED ACTIVITIES; APPLIED RESEARCH
Procurement Instrument Identifier:
N0017322P2016
Link:
View Award on USAspending website
Award Or Idv Flag:
AWARD
Award Type:
PURCHASE ORDER
Action Obligation:
528450.00
Base And Exercised Options Value:
528450.00
Base And All Options Value:
528450.00
Awarding Agency Name:
Department of Defense
Performance Start Date:
2022-09-27
Description:
P-8 ALD/MLD FLUIDIZED BED SYSTEM
Naics Code:
333242: SEMICONDUCTOR MACHINERY MANUFACTURING
Product Or Service Code:
3670: SPECIALIZED SEMICONDUCTOR, MICROCIRCUIT, AND PRINTED CIRCUIT BOARD MANUFACTURING MACHINERY
Procurement Instrument Identifier:
N0002415P4568
Link:
View Award on USAspending website
Award Or Idv Flag:
AWARD
Award Type:
PO
Action Obligation:
0.00
Base And Exercised Options Value:
0.00
Base And All Options Value:
0.00
Awarding Agency Name:
Department of Defense
Performance Start Date:
2015-09-24
Description:
IGF::OT::IGF STATUS REPORT
Naics Code:
541712: RESEARCH AND DEVELOPMENT IN THE PHYSICAL, ENGINEERING, AND LIFE SCIENCES (EXCEPT BIOTECHNOLOGY)
Product Or Service Code:
AC32: R&D- DEFENSE SYSTEM: SHIPS (APPLIED RESEARCH/EXPLORATORY DEVELOPMENT)

USAspending Awards / Financial Assistance

Date:
2021-06-03
Link:
View on USAspending
Awarding Agency Name:
Department of Energy
Transaction Description:
CATALYST ACTIVE SITE DESIGN BY ATOMIC LAYER DEPOSITION FOR ADVANCED CHEMICAL MANUFACTURING
Obligated Amount:
2561500.00
Face Value Of Loan:
0.00
Total Face Value Of Loan:
0.00
Date:
2020-07-28
Link:
View on USAspending
Awarding Agency Name:
Department of Energy
Transaction Description:
REDUCING THE COST AND ENERGY OF LITHIUM-ION BATTERY MANUFACTURING USING HIGH THROUGHPUT ATOMIC LAYER DEPOSITION PROCESSES
Obligated Amount:
3526584.00
Face Value Of Loan:
0.00
Total Face Value Of Loan:
0.00
Date:
2017-08-22
Link:
View on USAspending
Awarding Agency Name:
Department of Energy
Transaction Description:
LOW-COST MANUFACTURING OF HIGH PERFORMANCE DENOX CATALYSTS
Obligated Amount:
155000.00
Face Value Of Loan:
0.00
Total Face Value Of Loan:
0.00
Date:
2017-03-02
Link:
View on USAspending
Awarding Agency Name:
Department of Energy
Transaction Description:
HIGHLY ROBUST LOW-PGM MEAS BASED ON COMPOSITE SUPPORTS
Obligated Amount:
155000.00
Face Value Of Loan:
0.00
Total Face Value Of Loan:
0.00
Date:
2016-06-22
Link:
View on USAspending
Awarding Agency Name:
Department of Energy
Transaction Description:
LOW‐COST ENCAPSULATION OF SILICON‐BASED NANOPOWDERS
Obligated Amount:
155000.00
Face Value Of Loan:
0.00
Total Face Value Of Loan:
0.00

Trademarks

Serial Number:
97930320
Mark:
ATOMIC ARMOUR
Status:
ABANDONED-FAILURE TO RESPOND OR LATE RESPONSE
Mark Type:
TRADEMARK
Application Filing Date:
2023-05-10
Mark Drawing Type:
Standard character mark
Mark Literal Elements:
ATOMIC ARMOUR
USPTO Link:
View Trademark on United States Patent and Trademark Office Website

Goods And Services

For:
powders treated by atomic layer deposition; powders treated by atomic layer deposition for use in battery cathodes, battery anodes, additive manufacturing, catalyst applications, pharmaceutical applications and magnetics applications; powders encapsulated with a coating derived from atomic layer dep...
International Classes:
001 - Primary Class
Class Status:
Active
Serial Number:
97930325
Mark:
ATOMIC ARMOUR
Status:
ABANDONED-FAILURE TO RESPOND OR LATE RESPONSE
Mark Type:
SERVICE MARK
Application Filing Date:
2023-05-10
Mark Drawing Type:
Standard character mark
Mark Literal Elements:
ATOMIC ARMOUR
USPTO Link:
View Trademark on United States Patent and Trademark Office Website

Goods And Services

For:
treatment of materials in the nature of particles, powders, substrates and objects by means of atomic layer deposition; treatment of particles, powders, substrates and objects by molecular layer deposition
International Classes:
040 - Primary Class
Class Status:
Active
Serial Number:
87419394
Mark:
F FORGE NANO
Status:
SECTION 8 & 15-ACCEPTED AND ACKNOWLEDGED
Mark Type:
SERVICE MARK
Application Filing Date:
2017-04-20
Mark Drawing Type:
Illustration: Drawing or design which also includes word(s)/letter(s)/number(s)
Mark Literal Elements:
F FORGE NANO
USPTO Link:
View Trademark on United States Patent and Trademark Office Website

Goods And Services

For:
Treatment of materials by means of atomic layer deposition; Treatment of materials in the nature of particles by means of atomic layer deposition
First Use:
2016-11-03
International Classes:
040 - Primary Class
Class Status:
Active
Serial Number:
97673935
Mark:
ATOMIC ARMOR
Status:
A Statement of Use has been forwarded to the examining attorney for examination.
Mark Type:
Trademark
Application Filing Date:
2022-11-11
Mark Drawing Type:
4 - STANDARD CHARACTER MARK
Mark Literal Elements:
ATOMIC ARMOR
USPTO Link:
View Trademark on United States Patent and Trademark Office Website

Goods And Services

For:
Chemical preparations in the nature of powders treated by atomic layer deposition for scientific purposes, and general industrial manufacturing; Chemical preparations in the nature of powders treated by atomic layer deposition for use in battery cathodes, battery anodes, additive manufacturing, phar...
First Use:
2023-06-20
International Classes:
001 - Primary Class
Class Status:
ACTIVE
Serial Number:
98579345
Mark:
TEPHRA
Status:
NOTICE OF ALLOWANCE - ISSUED
Mark Type:
TRADEMARK
Application Filing Date:
2024-05-31
Mark Drawing Type:
Standard character mark
Mark Literal Elements:
TEPHRA
USPTO Link:
View Trademark on United States Patent and Trademark Office Website

Goods And Services

For:
Equipment and machines for the processing of semiconductor substrates, thin films, and silicon wafers, namely, machines for thin-film coating, using atomic layer deposition, the surface of semiconductor substrates, silicon wafers, and machines for manufacturing thin films, using atomic layer deposit...
International Classes:
007 - Primary Class
Class Status:
Active

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12300 Grant St Ste 110 Thornton CO 80241 US

ALD NANOSOLUTIONS, INC.

Date of last update: 14 Jul 2025

Sources: Colorado's Secretary of State

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